IX 25:
Fuji's finest grain double emulsion ASTM E94 class 1 (ASTM E-1815 Special) film having maximum sharpness and discrimination characteristics. It is suitable for new materials such as carbon fiber, reinforced plastics, ceramic products, and micro electric parts. IX 25 is generally used in direct exposure techniques or with lead screens.
IX 50:
An ultra-fine grain, high contrast ASTM E94 Class 1 (ASTM E-1815 Class 1) film having excellent sharpness and high discrimination characteristics. It is suitable for use with any low atomic number material where fine image detail is imperative. Its ultra-fine grain makes it useful in high energy, low subject contrast applications where high curie isotopes or high output X-ray machines permit its use. Wide exposure latitude has been demonstrated in high subject contrast applications. IX 50 is generally used in direct exposure techniques or with lead screens.
IX 80:
An extremely fine grain, high contrast ASTM E94 Class 1 (ASTM E-1815 Class 1) film suitable for detection of minute defects. It is applicable to the inspection of low atomic number material with low kilovoltage X-ray sources as well as inspection of higher atomic number materials with high kilovoltage X-ray or gamma ray sources. Wide exposure latitude has been demonstrated in high subject contrast applications. IX 80 is generally used in direct exposure techniques or with lead screens.
IX 100:
A very fine grain, high contrast ASTM E94 Class 2 (ASTM E-1815 Class 2) film suitable for the inspection of light metals with low activity radiation sources and for inspection of thick, higher density specimens with high kilovoltage X-ray or gamma ray sources. Wide exposure latitude has been demonstrated in high contrast subject applications. Although IX 100 is generally used in direct exposure techniques or with lead screens, it is suitable for use with fluorescent or fluorometallic screens.
IX 150:
A high speed, fine grain, high contrast ASTM E94 Class 2 (ASTM E-1815 Class 3) film suitable for inspection of a large variety of specimens with low-to-high kilovoltage X-ray and gamma ray sources. It is particularly useful when gamma ray sources of high activity are unavailable or when very thick specimens are to be inspected. It is also useful in X-ray diffraction work. IX 150 is used in direct exposure techniques or with lead screens.